- post-anneal dopant concentration
- концентрация примесей в образцах после отжига
English-Russian dictionary of mechanical engineering and automation. - RUSSO. B.S. Voskoboinikov, V.L. Mitrovich. 2003.
post-anneal dopant concentration
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Monolayer doping — (MLD) is a well controlled, wafer scale surface doping technique first developed at the University of California, Berkeley, in 2007.[1] This work is aimed for attaining controlled doping of semiconductor materials with atomic accuracy, especially … Wikipedia
